Job description You will develop and qualify OPC technology on imec 7nm node and beyond. Therefore you possess strong lithography/OPC knowledge in FEOL and/or BEOL; and good understanding of high performance CMOS patterning/design integration. You are experienced in lithography/OPC process development and must be capable of collaborating with process integration development teams, as well as designers. Previous technology development experience is a plus. Specific responsibilities will include: Development of OPC technology for imec 7nm node and beyond. Definition/assessment of Design Rules for imec 7nm node and beyond. Collaboration with EDA partners on innovative computational lithography solutions.
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